Method of manufacturing nano metal grating and nano metal grating manufactured thereby
US10545270B2 · kind B2 · utility
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9Claims
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Key dates
| Filing date | Nov 8, 2017 |
| Grant date | Jan 28, 2020 |
| Priority date | — |
| Expiry date | Mar 9, 2038 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/0002
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A method of manufacturing a nano metal grating is provided. In the method, a patterned metal oxide film is formed on a surface of the metal layer through the formation of metal oxides in an oxygen ashing process, and the nano metal grating is manufactured by using the patterned metal oxide film as a mask. Thus, a drawback that the metal layer cannot be etched after the metal layer is oxidized is solved, and the metal oxide film is not only used as a mask to manufacture the nano metal grating, but the metal oxide film is also used as a protective layer of the nano metal grating.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.