Patent · US Active

Ultraviolet light-resistant articles and methods for making the same

US10548234B2 · kind B2 · utility

0Cited by
9References
13Claims
0Family size

Assignee

Inventors

Key dates

Filing dateOct 19, 2016
Grant dateJan 28, 2020
Priority date
Expiry dateJun 18, 2037

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH01J2237/3321
  • WIPO fieldSurface technology, coating
  • WIPO sectorChemistry

Abstract

An ultraviolet light-resistant article that includes: a substrate having a glass or glass-ceramic composition and first and second primary surfaces; an ultraviolet light-absorbing element having a an absorptivity greater than 50% at wavelengths from about 100 nm to about 380 nm and a thickness between about 10 nm and about 100 nm; and a dielectric stack formed with a plasma-enhanced process. Further, the light-absorbing element is between the substrate and the dielectric stack. Alternatively, the light-absorbing element can include one or more ultraviolet light-resistant layers disposed within the dielectric stack over the first primary surface.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.