Vapor deposition system
US10550474B1 · kind B1 · utility
0Cited by
16References
13Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Feb 17, 2011 |
| Grant date | Feb 4, 2020 |
| Priority date | — |
| Expiry date | Apr 11, 2035 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC23C14/568
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A deposition system includes a system housing having a housing interior, a fixture transfer assembly having a generally sloped fixture transfer rail extending through the housing interior, a plurality of processing chambers connected by the fixture transfer rail, a controller interfacing with the processing chambers and at least one fixture carrier assembly carried by the fixture transfer rail and adapted to contain at least one substrate. The fixture carrier assembly travels along the fixture transfer rail under influence of gravity.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.