Patent · US Active

Vapor deposition system

US10550475B2 · kind B2 · utility

0Cited by
16References
12Claims
0Family size

Assignee

Inventors

Key dates

Filing dateOct 16, 2012
Grant dateFeb 4, 2020
Priority date
Expiry dateDec 15, 2034

Classification

  • Technology area (CPC C)Chemistry; Metallurgy
  • CPC primaryC23C14/568
  • WIPO fieldSurface technology, coating
  • WIPO sectorChemistry

Abstract

A deposition system includes a system housing having a housing interior, a fixture transfer assembly having a generally sloped fixture transfer rail extending through the housing interior, a plurality of processing chambers connected by the fixture transfer rail, a controller interfacing with the processing chambers and at least one fixture carrier assembly carried by the fixture transfer rail and adapted to contain one substrate. The fixture carrier assembly travels along the fixture transfer rail under influence of gravity.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.