Photopatternable compositions and methods of fabricating transistor devices using same
US10551745B2 · kind B2 · utility
1Cited by
3References
23Claims
0Family size
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Key dates
| Filing date | Apr 24, 2017 |
| Grant date | Feb 4, 2020 |
| Priority date | — |
| Expiry date | Jul 12, 2037 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH10K10/462
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
The present teachings relate to compositions for forming a negative-tone photopatternable dielectric material, where the compositions include, among other components, an organic filler and one or more photoactive compounds, and where the presence of the organic filler enables the effective removal of such photoactive compounds (after curing, and during or after the development step) which, if allowed to remain in the photopatterned dielectric material, would lead to deleterious effects on its dielectric properties.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.