Shadow mask generation using elevation data
US10553020B1 · kind B1 · utility
Assignee
Inventors
Key dates
| Filing date | Mar 20, 2018 |
| Grant date | Feb 4, 2020 |
| Priority date | — |
| Expiry date | Apr 7, 2038 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG06T2215/16
- WIPO fieldComputer technology
- WIPO sectorElectrical engineering
Abstract
A method can include determining, based on elevation data of a geographic region corresponding to a location at which an image was captured and a solar elevation angle at a time the image was captured, whether each pixel of the image is a shadow or a non-shadow to create a shadow mask of the image, generating an eroded shadow mask that includes the shadow mask with a specified number of pixels from a perimeter of each shadow in the shadow mask changed to respective values corresponding to non-shadows, generating a dilated shadow mask that includes the specified number of pixels in the shadow mask changed to values corresponding to shadows, and refining the shadow mask using the eroded shadow mask and the dilated shadow mask to create a refined shadow mask.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.