Electronic substrates and interposers made from nanoporous films
US10553358B2 · kind B2 · utility
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24Claims
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Key dates
| Filing date | Apr 27, 2017 |
| Grant date | Feb 4, 2020 |
| Priority date | — |
| Expiry date | Apr 27, 2037 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH10D62/123
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
An electronic substrate or interposer comprising nanoporous films, such as anodic aluminum oxide, containing vertically etched openings (“vias”) that are filled with a conductive material, forming a high density collection of vertically oriented vias that conduct electricity from one side of the substrate to the other.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.