Patent · US Active

Electropolishing method and product

US10557212B2 · kind B2 · utility

0Cited by
12References
15Claims
0Family size

Assignee

Inventor

Key dates

Filing dateMar 8, 2017
Grant dateFeb 11, 2020
Priority date
Expiry dateMay 26, 2037

Classification

  • Technology area (CPC C)Chemistry; Metallurgy
  • CPC primaryC25F3/20
  • WIPO fieldSurface technology, coating
  • WIPO sectorChemistry

Abstract

A method for electropolishing a metal substrate comprises submerging at least part of the metal substrate in an electrolyte solution and applying electrical current to the metal substrate to form an electrical circuit where the metal substrate is the anode. The electrolyte solution comprises phosphoric acid and at least one acrylic monomer and/or acrylic polymer.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.