Parallax minimization stitching method and apparatus using control points in overlapping region
US10558881B2 · kind B2 · utility
1Cited by
5References
12Claims
0Family size
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Key dates
| Filing date | Jul 28, 2017 |
| Grant date | Feb 11, 2020 |
| Priority date | — |
| Expiry date | Apr 11, 2038 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH04N2013/0088
- WIPO fieldAudio-visual technology
- WIPO sectorElectrical engineering
Abstract
Provided is a parallax minimization stitching method and apparatus using control points in an overlapping region. A parallax minimization stitching method may include defining a plurality of control points in an overlapping region of a first image and a second image received from a plurality of cameras, performing a first geometric correction by applying a homography to the control points, defining a plurality of patches based on the control points, and performing a second geometric correction by mapping the patches.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.