Patent · US Active

Slurry supply and/or chemical blend supply apparatuses, processes, methods of use and methods of manufacture

US10562151B2 · kind B2 · utility

2Cited by
114References
30Claims
0Family size

Assignee

Inventors

Key dates

Filing dateSep 6, 2017
Grant dateFeb 18, 2020
Priority date
Expiry dateOct 30, 2037

Classification

  • Technology area (CPC Y)Emerging Cross-Sectional Technologies
  • CPC primaryY10T137/87652
  • WIPO fieldMachine tools
  • WIPO sectorMechanical engineering

Abstract

A slurry and/or chemical blend supply apparatus suitable for providing slurry and/or chemical blend to chemical mechanical planarization (CMP) tools or other tools in a semiconductor fabrication facility, related processes, methods of use and methods of manufacture. The slurry and/or chemical blend supply apparatus includes one or more of the following: feed module, blend module, analytical module and distribution module.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.