Patent · US Active

Production method for a layer structure and layer structure

US10563306B2 · kind B2 · utility

0Cited by
0References
5Claims
0Family size

Assignee

Inventors

Key dates

Filing dateJan 9, 2017
Grant dateFeb 18, 2020
Priority date
Expiry dateMar 30, 2038

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH01B5/14
  • WIPO fieldSurface technology, coating
  • WIPO sectorChemistry

Abstract

A production method for a layer structure, including providing a substrate, wherein at least a top surface of the substrate is made from a non-conductive material; depositing a catalyst structure onto the top surface of the substrate; depositing a graphene structure onto the catalyst structure; and at least partially removing the catalyst structure situated between the substrate and the graphene structure.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.