Production method for a layer structure and layer structure
US10563306B2 · kind B2 · utility
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Key dates
| Filing date | Jan 9, 2017 |
| Grant date | Feb 18, 2020 |
| Priority date | — |
| Expiry date | Mar 30, 2038 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01B5/14
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A production method for a layer structure, including providing a substrate, wherein at least a top surface of the substrate is made from a non-conductive material; depositing a catalyst structure onto the top surface of the substrate; depositing a graphene structure onto the catalyst structure; and at least partially removing the catalyst structure situated between the substrate and the graphene structure.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.