Method of using equipment method and system for manufacturing mask or display substrate
US10564540B2 · kind B2 · utility
0Cited by
7References
12Claims
0Family size
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Key dates
| Filing date | Mar 9, 2017 |
| Grant date | Feb 18, 2020 |
| Priority date | — |
| Expiry date | Apr 2, 2037 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG02F1/1303
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
The present disclosure relates to a method of using an equipment for manufacturing or using a mask or a display substrate; and the method includes: providing a master plate; setting, on the master plate, a plurality of measuring points corresponding to positions of the mask or the display substrate where a pixel position accuracy measurement is to be implemented, according to the mask or the display substrate to be measured; and placing the master plate in a coordinate system of the equipment, and measuring error values between the equipment and the master plate at the measuring points.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.