Apparatus, system, and method for handling magnetic devices
US10566134B2 · kind B2 · utility
0Cited by
4References
3Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jun 30, 2017 |
| Grant date | Feb 18, 2020 |
| Priority date | — |
| Expiry date | Oct 20, 2037 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB65G47/91
- WIPO fieldHandling
- WIPO sectorMechanical engineering
Abstract
An apparatus for positioning magnetic components may include a base. The base may include an upper surface. The base may include a lower surface. The base may include a contact surface. The base may include a vacuum line in communication with the upper surface and the contact surface. The base may include a first pin. The base may include a second pin. The first pin and the second pin may be positioned adjacent the contact surface. The first pin and the second pin may protrude from the lower surface of the base. The base may be configured to generate a vacuum at the contact surface when a vacuum is applied to the vacuum line.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.