Hexavalent chromium free etch manganese recovery system
US10569186B2 · kind B2 · utility
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24Claims
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Key dates
| Filing date | Jul 10, 2018 |
| Grant date | Feb 25, 2020 |
| Priority date | — |
| Expiry date | Jul 10, 2038 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC23C18/31
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
Methods for recovering manganese etchant solutions are provided wherein a process solution used to rinse or neutralize a nonconductive substrate after etching the substrate is collected and evaporated to provide a concentrated process solution that is fed back into the manganese etchant solution or acid rinse.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.