Self-cleaning film system and method of forming same
US10569263B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Apr 4, 2018 |
| Grant date | Feb 25, 2020 |
| Priority date | — |
| Expiry date | Apr 24, 2038 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG02B1/11
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
A method of forming a film system includes depositing a monolayer formed from a fluorocarbon onto a substrate. After depositing, the method includes ablating the monolayer to define a plurality of cavities therein, wherein each of the plurality of cavities is spaced apart from an adjacent one of the plurality of cavities along the monolayer. After ablating, the method includes embedding a photocatalytic material into each of the plurality of cavities to form a film on the substrate and thereby form the film system. The film system includes a plurality of regions including the photocatalytic material and disposed within the monolayer such that each of the plurality of regions abuts and is surrounded by the fluorocarbon.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.