Patent · US Active

Method and apparatus for release-assisted microcontact printing of MEMS

US10570005B2 · kind B2 · utility

0Cited by

6References

15Claims

0Family size

Assignee

Massachusetts Institute of Technology · US

Inventors

Apoorva Murarka · Cambridge, US
Vladimir Bulovic · Lexington, US
Sarah Paydavosi · Winchester, US

Key dates

Filing date	Sep 5, 2012
Grant date	Feb 25, 2020
Priority date	—
Expiry date	Sep 5, 2032

Classification

Technology area (CPC B)Performing Operations; Transporting
CPC primaryB81C2201/0194
WIPO fieldMicro-structural and nano-technology
WIPO sectorChemistry

Abstract

The disclosure provides methods and apparatus for release-assisted microcontact printing of MEMS. Specifically, the principles disclosed herein enable patterning diaphragms and conductive membranes on a substrate having articulations of desired shapes and sizes. Such diaphragms deflect under applied pressure or force (e.g., electrostatic, electromagnetic, acoustic, pneumatic, mechanical, etc.) generating a responsive signal. Alternatively, the diaphragm can be made to deflect in response to an external bias to measure the external bias/phenomenon. The disclosed principles enable transferring diaphragms and/or thin membranes without rupturing.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.