Mask frame, a mask frame manufacturing method and a mask
US10570499B2 · kind B2 · utility
Assignees
Inventor
Key dates
| Filing date | Jul 13, 2017 |
| Grant date | Feb 25, 2020 |
| Priority date | — |
| Expiry date | Jul 25, 2037 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH10K71/166
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
Disclosed are a mask frame, for mask frame manufacturing method and mask. The mask frame includes a main frame and shielding bars, an evaporation-deposition area penetrating the main frame in a thickness direction being formed on the main frame, the main frame being provided with pairs of first receiving slots, the two first receiving slots in each pair being located on both sides of the evaporation-deposition area in a first direction, respectively, each shielding bar corresponding to a pair of first receiving slot, two ends of shielding bars being disposed within corresponding two first receiving slots, respectively. The mask frame comprises at least one pair of first positioning holes, each pair of which corresponds to one pair of first receiving slots, and the two first positioning holes in each pair correspond to positions of the two first receiving slots in a corresponding pair, respectively.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.