Nanolaminate gas sensor and method of fabricating a nanolaminate gas sensor using atomic layer deposition
US10571420B2 · kind B2 · utility
1Cited by
1References
10Claims
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Key dates
| Filing date | Dec 14, 2015 |
| Grant date | Feb 25, 2020 |
| Priority date | — |
| Expiry date | Jun 21, 2036 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01N33/004
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A thin film gas sensor device includes a substrate, a first electrode supported by the substrate, a second electrode supported by the substrate, and a gas-sensitive structure. The gas-sensitive structure is supported by the substrate and is electrically connected to the first and second electrodes. The gas sensitive structure includes a plurality of thin film layers of a first material vertically interleaved with a plurality of thin film layers of a second material. The first and second materials are mutually catalytic materials.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.