Mask plates and photo spacers and methods for preparing the same and display panels
US10571751B2 · kind B2 · utility
1Cited by
1References
15Claims
0Family size
Assignees
Inventors
Key dates
| Filing date | Jan 23, 2017 |
| Grant date | Feb 25, 2020 |
| Priority date | — |
| Expiry date | Jul 9, 2037 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/20
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A mask plate and a photo spacer and methods for preparing the same, and a display panel comprising the photo spacer are disclosed. In the mask plate, at least one exposure area is formed, the at least one exposure area comprising a central region and a peripheral region, wherein light transmittance of the central region is greater than light transmittance of the peripheral region.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.