Photolithography mask plate
US10571798B2 · kind B2 · utility
3Cited by
2References
10Claims
0Family size
Assignees
Inventors
Key dates
| Filing date | Aug 23, 2017 |
| Grant date | Feb 25, 2020 |
| Priority date | — |
| Expiry date | Sep 11, 2037 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/30
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A photolithography mask plate, the photolithography mask plate including: a substrate; a carbon nanotube layer located on the substrate; a patterned chrome layer located on the carbon nanotube layer, wherein the patterned chrome layer and the carbon nanotube layer have the same pattern; a cover layer located on the patterned chrome layer.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.