Photocurable composition for imprint, method of producing cured film, method of producing optical component, method of producing circuit board, and method of producing electronic component
US10571802B2 · kind B2 · utility
1Cited by
0References
22Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Dec 15, 2015 |
| Grant date | Feb 25, 2020 |
| Priority date | — |
| Expiry date | Dec 15, 2035 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH05K3/0011
- WIPO fieldMacromolecular chemistry, polymers
- WIPO sectorChemistry
Abstract
The present invention relates to a photocurable composition for imprint in a condensable gas atmosphere. The composition at least includes a polymerizable compound component (A) and photopolymerization initiator component (B) and satisfies the Requirement (1):
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.