Assembly in a microlithographic projection exposure apparatus

US10571816B2 · kind B2 · utility

Assignee

• Carl Zeiss SMT GmbH · DE

Inventors

• Jasper Wesselingh · Mettingen, DE
• Michael Erath · Dietenheim, DE
• Ansgar Holle · Heidenheim, DE
• Stefan Troeger · Ulm, DE
• Alexander Vogler · Aalen, DE

Key dates

• Filing date: May 20, 2019
• Grant date: Feb 25, 2020
• Expiry date: May 20, 2039

Classification

• Technology area (CPC F): Mechanical Engineering; Lighting; Heating
• CPC primary: F16C2370/20
• WIPO field: Optics
• WIPO sector: Instruments

Abstract

The disclosure relates to an assembly in a microlithographic projection exposure apparatus, with an optical element and at least one weight compensating device, which includes at least one magnetic circuit. A magnetic field generated by this magnetic circuit brings about a force for compensating at least partially for the force of the weight acting on the optical element. The apparatus also includes a coil arrangement with a plurality of coils. The arrangement is energizable with electrical current to generate a compensating force acting on the optical element. This compensating force compensates at least partially for a parasitic force that is exerted by the magnetic circuit when there is movement of the optical element and does not contribute to the compensation for the force of the weight acting on the optical element.