Methods and systems for generating a three-dimensional holographic mask having topographical pattern with more than two discrete levels
US10571861B2 · kind B2 · utility
2Cited by
17References
15Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Sep 23, 2016 |
| Grant date | Feb 25, 2020 |
| Priority date | — |
| Expiry date | Sep 22, 2037 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03H2210/30
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A system for surface patterning using a three dimensional holographic mask includes a light source configured to emit a light beam toward the holographic mask. The holographic mask can be formed as a topographical pattern on a transparent mask substrate. A semiconductor substrate can be positioned on an opposite site of the holographic mask as the light source and can be spaced apart from the holographic mask. The system can also include a base for supporting the semiconductor substrate.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.