Patent · US Active

Plasma apparatus and method for producing the same

US10573525B2 · kind B2 · utility

0Cited by
7References
14Claims
0Family size

Assignee

Inventors

Key dates

Filing dateMay 8, 2013
Grant dateFeb 25, 2020
Priority date
Expiry dateOct 6, 2034

Classification

  • Technology area (CPC Y)Emerging Cross-Sectional Technologies
  • CPC primaryY10T29/49002
  • WIPO fieldChemical engineering
  • WIPO sectorChemistry

Abstract

[Object] To provide a plasma apparatus capable of igniting plasma reliably over a long period.[Solution] The apparatus includes a hollow structural body (11) having a hollow structure along an axis, a first electrode (12) disposed inside the hollow structural body (11), and a second electrode (14) having a structure that externally covers a plasma generation area (13) of the hollow structural body (11). The first electrode (12) has a deformation structure (12b) within the plasma generation area of the hollow structural body.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.