Solar cell and method of manufacturing the same
US10573770B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Apr 13, 2016 |
| Grant date | Feb 25, 2020 |
| Priority date | — |
| Expiry date | Oct 31, 2036 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY02E10/548
- WIPO fieldAudio-visual technology
- WIPO sectorElectrical engineering
Abstract
Discussed is a method of manufacturing a solar cell including preparing a single crystalline silicon substrate having a first conductive type impurity; forming a non-single crystalline silicon emitter layer having a second conductive type impurity opposite to the first conductive type impurity on a first surface of the single crystalline silicon substrate; forming a first transparent conductive oxide layer on the first surface of the single crystalline silicon substrate; forming a first electrode electrically connected to the first transparent conductive oxide layer; and forming a second electrode electrically connected to the single crystalline silicon substrate, wherein the forming of the first electrode includes; forming a first seed layer on the first transparent conductive oxide layer, and forming a first plating layer over the first seed layer by plating a first conductive material.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.