Patent · US Active

Apparatus, system and method for providing an end effector

US10576639B2 · kind B2 · utility

4Cited by
10References
14Claims
0Family size

Assignee

Inventors

Key dates

Filing dateFeb 6, 2018
Grant dateMar 3, 2020
Priority date
Expiry dateApr 30, 2038

Classification

  • Technology area (CPC Y)Emerging Cross-Sectional Technologies
  • CPC primaryY10S414/141
  • WIPO fieldHandling
  • WIPO sectorMechanical engineering

Abstract

The disclosure provides an apparatus, system and method for providing an end effector. The end effector may be capable of accommodating semiconductor wafers of varying sizes, and may include: a wafer support; a bearing arm capable of interfacing with at least one robotic element, and at least partially bearing the wafer support at one end thereof; a plurality of support pads on the wafer support for physically interfacing with a one of the semiconductor wafers; and a low friction moving clamp driven bi-directionally along a plane at least partially provided by the bearing arm, wherein the low friction moving clamp retractably applies force to a proximal edge of the semiconductor wafer.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.