Patent · US Active

Illumination optical unit for a metrology system and metrology system comprising such an illumination optical unit

US10578881B2 · kind B2 · utility

0Cited by
8References
20Claims
0Family size

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Key dates

Filing dateDec 14, 2018
Grant dateMar 3, 2020
Priority date
Expiry dateDec 14, 2038

Classification

  • Technology area (CPC G)Physics
  • CPC primaryG03F1/84
  • WIPO fieldOptics
  • WIPO sectorInstruments

Abstract

An illumination optical unit serves for illuminating objects to be examined by a metrology system. The illumination optical unit has an optical pupil shaping assembly for generating a defined distribution of illumination angles of illumination light over an object field in which an object to be examined can be arranged. An optical field shaping assembly for generating a defined intensity distribution of the illumination light over the object field is disposed downstream of the pupil shaping assembly in the beam path of the illumination light. The field shaping assembly has at least one optical field shaping element arranged in the region of a pupil plane of the illumination optical unit. This results in an illumination optical unit which ensures an illumination which can be set in a defined manner with regard to an intensity distribution and an illumination angle distribution over the entire object field.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.