Patent · US Active

Optical element, in particular for a microlithographic projection exposure apparatus

US10578974B2 · kind B2 · utility

0Cited by

1References

20Claims

0Family size

Assignee

Carl Zeiss SMT GmbH · DE

Inventors

Ralf Moser · Abensberg, DE
Florian Herold · Bielefeld, DE
Arno Schmittner · Oberkochen, DE
Holger Kierey · Aalen, DE
Wolfgang Merkel · Neu-Ulm, DE
Georgo Metalidis · Zang, DE

Key dates

Filing date	Jun 20, 2019
Grant date	Mar 3, 2020
Priority date	—
Expiry date	Jun 20, 2039

Classification

Technology area (CPC G)Physics
CPC primaryG21K1/065
WIPO fieldOptics
WIPO sectorInstruments

Abstract

The disclosure relates to an optical element, in particular for a microlithographic projection exposure apparatus. The optical element has an optical effective surface. The optical element includes a substrate, a layer system that is present on the substrate, and a protective cover extending over an edge region of the optical element that is adjacent to the optical effective surface. During operation of the optical element, the protective coating reduces an ingress of hydrogen radicals into the layer system in comparison with an analogous design without the protective cover, wherein a gap is formed between the protective cover and the layer system.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.