Vapor deposition apparatus
US10580683B2 · kind B2 · utility
Assignee
Inventor
Key dates
| Filing date | May 19, 2016 |
| Grant date | Mar 3, 2020 |
| Priority date | — |
| Expiry date | Jun 22, 2038 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC23C16/4585
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A vapor deposition apparatus comprises a vacuum chamber, at least two movable holders and an alignment system. A pedestal, a backboard supported on the pedestal and a metal mask located above the backboard are disposed inside the vacuum chamber, wherein an anti-plasma coated layer is provided on the metal mask; each of the movable holders is configured to clamp an end of the metal mask on which a pulling force can be applied; and the alignment system is configured to drive the movable holders to move in at least one direction of a first direction and a second direction that are perpendicular to each other within a plane in parallel to the backboard and a third direction perpendicular to the plane to perform at least one of applying a pulling force on the metal mask and attaching the metal mask onto a preset location of the backboard.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.