Patent · US Active

Photolithographic patterning of organic electronic devices

US10580987B2 · kind B2 · utility

2Cited by

21References

10Claims

0Family size

Assignee

Orthogonal, Inc. · US

Inventors

John Andrew DeFranco · Rochester, US
Terrence R. O'Toole · Webster, US

Key dates

Filing date	Jul 31, 2015
Grant date	Mar 3, 2020
Priority date	—
Expiry date	Apr 26, 2036

Classification

Technology area (CPC H)Electricity
CPC primaryH10K59/805
WIPO fieldOptics
WIPO sectorInstruments

Abstract

A method of patterning an organic device includes depositing a first organic functional layer over a device substrate to form a first intermediate structure, the first organic functional layer having a first function such as hole transport or electron transport. The first intermediate structure is coated with a fluoropolymer and treated in a processing agent comprising a fluorinated solvent in which the fluoropolymer is soluble to form a processed intermediate structure. A second organic functional layer is deposited over at least a portion of the first organic functional layer, the second organic functional layer also having the first function.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.