Patent · US Active

Substrate for hot-dip galvanizing or hot-dip galvannealing, production method therefor, and hot-dip galvanized steel sheet or hot-dip galvannealed steel sheet

US10597764B2 · kind B2 · utility

0Cited by
1References
15Claims
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Assignee

Inventors

Key dates

Filing dateAug 11, 2015
Grant dateMar 24, 2020
Priority date
Expiry dateAug 11, 2035

Classification

  • Technology area (CPC Y)Emerging Cross-Sectional Technologies
  • CPC primaryY10T428/12993
  • WIPO fieldMaterials, metallurgy
  • WIPO sectorChemistry

Abstract

Provided is a technique in which a reduction annealing method is used to efficiently produce a high-strength hot-dip galvanizing substrate or high-strength hot-dip galvannealing substrate, which is useful as a raw material for producing a high-strength plated steel sheet suppressed in the occurrence of bare spot. The substrate for hot-dip galvanizing or hot-dip galvannealing of the present invention satisfies the following condition: when the mapping intensity of Fe, which is obtained by using an electron probe microanalyser in a measurement field of view of 33.6 μm×41.4 μm on the surface after reduction annealing, of 0 to 240 is divided into 16 parts at an interval of 15, the area occupied by a mapping intensity of 195 or more has 70% or more.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.