Patent · US Active

Mirror element, in particular for a microlithographic projection exposure apparatus

US10598921B2 · kind B2 · utility

0Cited by

1References

19Claims

0Family size

Assignee

Carl Zeiss SMT GmbH · DE

Inventors

Hartmut Enkisch · Aalen, DE
Martin Hermann · St Helens, AU
Christoph Nottbohm · Bielefeld, DE

Key dates

Filing date	Dec 11, 2017
Grant date	Mar 24, 2020
Priority date	—
Expiry date	Dec 11, 2037

Classification

Technology area (CPC G)Physics
CPC primaryG03F7/70958
WIPO fieldOptics
WIPO sectorInstruments

Abstract

A mirror element, in particular for a microlithographic projection exposure apparatus. According to one aspect, the mirror element includes a substrate (111, 112, 113, 114, 115, 211, 212, 213, 311a-311m, 411, 412, 413) and a layer stack (121, 122, 123, 124, 125, 221, 222, 223, 321a-321m, 421, 422, 423) on the substrate. The layer stack has at least one reflection layer system, wherein a curvature of the mirror element is generated on the basis of a setpoint curvature for a predetermined operating temperature by a non-vanishing bending force exerted by the layer stack, wherein the generated curvature varies by no more than 10% over a temperature interval (ΔT) of at least 10 K.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.