Secondary electron generating composition
US10599032B2 · kind B2 · utility
1Cited by
2References
34Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Mar 24, 2015 |
| Grant date | Mar 24, 2020 |
| Priority date | — |
| Expiry date | Mar 24, 2035 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L2224/8138
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
The present invention relates to a resist composition, especially for use in the production of electronic components via electron beam lithography. In addition to the usual base polymeric component (resist polymer), a secondary electron generator is included in resist compositions of the invention in order to promote secondary electron generation. This unique combination of components increases the exposure sensitivity of resists in a controlled fashion which facilitates the effective production of high-resolution patterned substrates (and consequential electronic components), but at much higher write speeds.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.