Anti-counterfeit signature
US10600058B2 · kind B2 · utility
0Cited by
3References
21Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Jun 27, 2013 |
| Grant date | Mar 24, 2020 |
| Priority date | — |
| Expiry date | Jun 13, 2035 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG09F3/00
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A method for applying an anti-counterfeit signature on a product, and an anti-counterfeit signature. The method includes selecting a substrate and a type of signature and forming a signature of the selected type on the substrate with atomic layer deposition, ALD, wherein forming the signature includes applying at least one layer having a predetermined property configured to be detected with an analysis method on the substrate by atomic layer deposition, ALD.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.