Patent · US Active

Self-assembly of nanostructures

US10600965B2 · kind B2 · utility

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8References
5Claims
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Key dates

Filing dateApr 17, 2017
Grant dateMar 24, 2020
Priority date
Expiry dateMay 13, 2037

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH10K71/191
  • WIPO fieldOrganic fine chemistry
  • WIPO sectorChemistry

Abstract

Structures and methods that include selective electrostatic placement based on a dipole-to-dipole interaction of electron-rich carbon nanotubes onto an electron-deficient pre-patterned surface. The structure includes a substrate with a first surface having a first isoelectric point and at least one additional surface having a second isoelectric point. A self-assembled monolayer is selectively formed on the first surface and includes an electron deficient compound including a deprotonated pendant hydroxamic acid or a pendant phosphonic acid group or a pendant catechol group bound to the first surface. An organic solvent can be used to deposit the electron rich carbon nanotubes on the self-assembled monolayer.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.