Patent · US Active

Device for the dry-cleaning of an additive manufacturing plate

US10603695B2 · kind B2 · utility

1Cited by
1References
16Claims
0Family size

Assignee

Inventors

Key dates

Filing dateJul 29, 2016
Grant dateMar 31, 2020
Priority date
Expiry dateMar 21, 2037

Classification

  • Technology area (CPC Y)Emerging Cross-Sectional Technologies
  • CPC primaryY02P10/25
  • WIPO fieldOther special machines
  • WIPO sectorMechanical engineering

Abstract

A device is provided for dry cleaning a plate used in an additive manufacturing process that involves powder. The device includes a confinement enclosure, a loader, and a dry-cleaning station. The confinement enclosure includes an entry lock through which a plate to be cleaned enters. The loader is located within the confinement enclosure and is structured to receive and transport the plate. The dry-cleaning station is located within the confinement enclosure and is structured to dry clean the plate. The dry-cleaning station includes a vibration device, which imposes vibrations on the plate, and a shock device, which causes the plate to experience shocks.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.