Patent · US Active

Methods for purifying 5-(halomethyl)furfural

US10604498B2 · kind B2 · utility

2Cited by
22References
20Claims
0Family size

Assignee

Inventors

Key dates

Filing dateAug 1, 2018
Grant dateMar 31, 2020
Priority date
Expiry dateAug 1, 2038

Classification

  • Technology area (CPC C)Chemistry; Metallurgy
  • CPC primaryC07D307/46
  • WIPO fieldOrganic fine chemistry
  • WIPO sectorChemistry

Abstract

The present disclosure provides methods for purifying a 5-(halomethyl)furfural composition, including 5-(chloromethyl)furfural, at operating conditions that decrease or minimize the decomposition or degradation of 5-(chloromethyl)furfural during the process. The methods may employ certain solvents, operating conditions, and/or techniques (e.g., gas stripping). The gaseous 5-(halomethyl)furfural produced from the process can be condensed or deposited to yield 5-(halomethyl)furfural in liquid or solid form. The solid 5-(halomethyl)furfural may be amorphous or crystalline.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.