Antireflection film containing inorganic particles and manufacturing method thereof
US10605960B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Dec 28, 2016 |
| Grant date | Mar 31, 2020 |
| Priority date | — |
| Expiry date | May 8, 2037 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG02B2207/107
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
An antireflection film including a hard coating layer; and a low refractive index layer including a binder resin and hollow and solid-type inorganic nanoparticles dispersed in the binder resin. The solid-type inorganic nanoparticles are distributed more than the hollow inorganic nanoparticles near the interface between the hard coating layer and the low refractive index layer. The hollow inorganic nanoparticles have a thickness of a shell layer to a particle radius ratio of 0.3 or less. A method for manufacturing an antireflection film including: coating a resin composition including a photocurable compound or a (co)polymer thereof, a fluorine-containing compound containing a photoreactive functional group, a photoinitiator, and hollow and solid-type inorganic nanoparticles onto a hard coating layer, drying at a temperature of 35° C. to 100° C. and photocuring the same. The hollow inorganic nanoparticles have a ratio of the thickness of a shell layer to the particle radius of 0.3 or less.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.