Method for preparing photoalignment layer
US10606128B2 · kind B2 · utility
3Cited by
8References
14Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Sep 6, 2016 |
| Grant date | Mar 31, 2020 |
| Priority date | — |
| Expiry date | May 27, 2037 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG02F1/133788
- WIPO fieldBasic materials chemistry
- WIPO sectorChemistry
Abstract
The present invention relates to a method for preparing a photo-alignment layer. The photo-alignment layer prepared by the preparation method exhibits a high imidization ratio as well as an excellent aligning stability of liquid crystal, chemical resistance and strength, and has an excellent afterimage suppressing effect by an AC driving of a liquid crystal display element.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.