Three-dimensional beam forming X-ray source
US10607802B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Mar 30, 2018 |
| Grant date | Mar 31, 2020 |
| Priority date | — |
| Expiry date | Jun 10, 2038 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2235/166
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
Three dimensional beam forming X-ray source includes an electron beam generator (EBG) to generate an electron beam. A target element is disposed a predetermined distance from the EBG and positioned to intercept the electron beam. The target element is responsive to the electron beam to generate X-ray radiation. A beam former is disposed proximate to the target element and comprised of a material which interacts with the X-ray radiation to form an X-ray beam. An EBG control system controls at least one of a beam pattern and a direction of the X-ray beam by selectively varying a location where the electron beam intersects the target element to control an interaction of the X-ray radiation with the beam-former.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.