Sputtering system and method including an arc detection
US10607821B2 · kind B2 · utility
0Cited by
18References
6Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Mar 8, 2017 |
| Grant date | Mar 31, 2020 |
| Priority date | — |
| Expiry date | Jun 8, 2038 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/0206
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A sputtering system that includes a sputtering chamber having a target material serving as a cathode, and an anode and a work piece. A direct current (DC) power supply supplies electrical power to the anode and the cathode sufficient to generate a plasma within the sputtering chamber. A detection module detects the occurrence of an arc in the sputtering chamber by monitoring an electrical characteristic of the plasma. In one embodiment the electrical characteristic monitored is the impedance of the plasma. In another embodiment the electrical characteristic is the conductance of the plasma.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.