Patent · US Active

Plasma discharge reactor with flowing liquid and gas

US10610850B2 · kind B2 · utility

1Cited by
15References
10Claims
0Family size

Assignee

Inventors

Key dates

Filing dateDec 11, 2017
Grant dateApr 7, 2020
Priority date
Expiry dateJun 3, 2038

Classification

  • Technology area (CPC B)Performing Operations; Transporting
  • CPC primaryB01J2219/0894
  • WIPO fieldOrganic fine chemistry
  • WIPO sectorChemistry

Abstract

The activation of the C—H bond using low temperature plasma with an inlet liquid stream such that value added products are formed effectively. An organic liquid (e.g., hexane which is immiscible with liquid water) is injected into a flowing gas (argon) stream followed by mixing with a liquid water stream. Thereafter, the mixture contacts a plasma region formed by a pulsed electric discharge. The plasma formed with the flowing liquid and gas between the two electrodes causes chemical reactions that generate various compounds.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.