Thin glass based article with high resistance to contact damage
US10612129B2 · kind B2 · utility
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3References
15Claims
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Key dates
| Filing date | Jun 22, 2017 |
| Grant date | Apr 7, 2020 |
| Priority date | — |
| Expiry date | Dec 5, 2037 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH05K5/03
- WIPO fieldMaterials, metallurgy
- WIPO sectorChemistry
Abstract
Provided herein are ion-implanted glass based articles with improved flaw suppression properties. The ion-implanted glass based articles generally have a final indent fracture threshold (IFT) load of at least 650 grams, and/or a scratch threshold force of at least 10 N, which represents at least 1.25-fold enhancement compared to the glass based article prior to ion-implantation. Factors affecting the efficacy of the ion implantation process can include the IFT load of the starting glass or glass ceramic substrate (native IFT load), ion type, ion dose, implant energy, beam current, and glass temperature.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.