Nanostructured layer for graded index freeform optics
US10612145B2 · kind B2 · utility
1Cited by
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19Claims
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Key dates
| Filing date | Jun 16, 2017 |
| Grant date | Apr 7, 2020 |
| Priority date | — |
| Expiry date | Jun 17, 2037 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/76808
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
The present disclosure relates to a method for creating an optical component having a spatially controlled refractive index. The method may involve applying a thin metal material layer to a substrate. The thin metal material layer may then be heated to create a mask having a spatially varying nano-particle distribution. The substrate may then be etched, using the mask, to imprint a spatially patterned nanostructure pattern on a surface the substrate.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.