Substrate processing device
US10615059B2 · kind B2 · utility
1Cited by
4References
10Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jun 13, 2016 |
| Grant date | Apr 7, 2020 |
| Priority date | — |
| Expiry date | Oct 25, 2036 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/68771
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
A substrate processing device (10) for processing a plurality of substrates disposed at predetermined intervals includes a processing bath (12) that is configured to store processing liquid, and has a side surface (13) extending along a thickness direction of the plurality of substrates, and a discharge unit (14) that is disposed in a bottom portion of the processing bath (12), and is configured to discharge processing liquid in an upward direction toward the side surface (13).
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.