Patent · US Active

Hydroxyl graphene-modified plating sealants and preparation methods thereof

US10619055B2 · kind B2 · utility

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12Claims
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Key dates

Filing dateApr 17, 2019
Grant dateApr 14, 2020
Priority date
Expiry dateApr 17, 2039

Classification

  • Technology area (CPC C)Chemistry; Metallurgy
  • CPC primaryC25D17/16
  • WIPO fieldBasic materials chemistry
  • WIPO sectorChemistry

Abstract

A hydroxyl graphene-modified plating sealant and a preparation method thereof are disclosed. The plating sealant comprises a film-forming material, a resist, a defoaming agent, a levelling agent, and deionized water; the resist is a nanoscale hydroxyl graphene aqueous solution comprising hydroxyl graphene having a mass fraction of 3.5% to 4% and a pH of 8.0 to 9.5. Nanoscale hydroxyl graphene is used as a resist in the plating sealant of the disclosure, then the hydroxyl groups on hydroxyl graphene can react with the hydroxyl groups of the film-forming material, i.e. silica sol and the silane polymer, by dehydration condensation, thereby significantly improving the performance of the sealing film. The sealing film has higher corrosion resistance and abrasion resistance compared with that prepared by graphene or reduced graphene oxide sealant.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.