Mask, manufacturing method thereof, patterning method employing mask, optical filter
US10620526B2 · kind B2 · utility
Assignees
Inventors
Key dates
| Filing date | Jul 8, 2016 |
| Grant date | Apr 14, 2020 |
| Priority date | — |
| Expiry date | Jul 13, 2037 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG02F1/13625
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A mask, a manufacturing method thereof, and a patterning method employing the mask. In the mask, a plurality of masks can be combined into one mask. The pattern area (01) of the mask is provided with a first pattern section (10) and a second pattern section (20) which are not overlapped with each other; light of a first wavelength can run through the first pattern section (10) but light of a second wavelength cannot run through the first pattern section; the light of the second wavelength can run thorough the second pattern section (20) but the light of the first wavelength cannot run through the second pattern section; and the light of the first wavelength and the light of the second wavelength can run through the non-pattern area, or any of the light of the first wavelength and the light of the second wavelength cannot run through the non-pattern area. The mask is obtained by combining a plurality of masks.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.