Color resist material of color filter and method for preparing color resist pattern of color filter
US10620536B2 · kind B2 · utility
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11Claims
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Key dates
| Filing date | Mar 28, 2018 |
| Grant date | Apr 14, 2020 |
| Priority date | — |
| Expiry date | Aug 4, 2038 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG02F2202/02
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A color resist material of a color filter and a method for preparing a color resist pattern of a color filter are provided. The color resist material of a color filter includes: a polyfunctional monomer including a divinylbenzene monomer.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.