Correction of angular error of plane-of-incidence azimuth of optical metrology device
US10621264B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | May 20, 2019 |
| Grant date | Apr 14, 2020 |
| Priority date | — |
| Expiry date | May 20, 2039 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70616
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Optical metrology is used to calibrate the plane-of-incidence (POI) azimuth error by determining and correcting an azimuth angle offset. The azimuth angle offset may be determined by measuring at least a partial Mueller matrix from a calibration grating on a sample held on a stage for a plurality of POI azimuth angles. An axis of symmetry is determined for a curve describing a value of a Mueller matrix element with respect to POI azimuth angle, for each desired wavelength and each desired Mueller matrix element. The axis of symmetry may then be used to determine the azimuth angle offset, e.g., by determining a mean, median or average of all, or a filtered subset, of the axes of symmetry. If desired, an axis of symmetry may be determined for data sets other than Mueller matrix elements, such as Fourier coefficients of measured signals.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.