Layout analysis on image
US10621428B1 · kind B1 · utility
Assignee
Inventors
Key dates
| Filing date | Jun 28, 2019 |
| Grant date | Apr 14, 2020 |
| Priority date | — |
| Expiry date | Jun 28, 2039 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG06T2207/30176
- WIPO fieldComputer technology
- WIPO sectorElectrical engineering
Abstract
The present application relates to layout analysis on an image. The layout analysis method includes: dividing, based on coordinate information of a plurality of paragraphs in an image, the plurality of paragraphs into one or more columns arranged in a horizontal direction, each column including one or more paragraphs of the plurality of paragraphs; for one or more paragraphs included in each of at least some of the one or more columns, determining a main paragraph in the column based on a first criterion related to geometric information of a paragraph; and for each of the columns, if one or more non-main paragraphs and the main paragraph in the column satisfy a geometric relationship for adding a main paragraph, taking the one or more non-main paragraphs as additional main paragraphs to the main paragraph.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.